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Sunday, April 19, 2020 | History

2 edition of Optical microlithography XV found in the catalog.

Optical microlithography XV

Optical microlithography XV

5-8 March, 2002, Santa Clara, [California], USA

by

  • 229 Want to read
  • 39 Currently reading

Published in Bellingham, Washington SPIE .
Written in English

    Subjects:
  • Integrated circuits -- Masks -- Congresses,
  • Microlithography -- Congresses,
  • X-ray lithography -- Congresses,
  • Manufacturing processes -- Congresses

  • Edition Notes

    Includes bibliographic references and author index.

    StatementAnthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
    GenreCongresses
    SeriesSPIE proceedings series -- v. 4691, Proceedings of SPIE--the International Society for Optical Engineering -- v. 4691.
    ContributionsYen, Anthony., Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., International SEMATECH (Organization)
    Classifications
    LC ClassificationsTK7835 .O664 2002
    The Physical Object
    Pagination2 v. :
    ID Numbers
    Open LibraryOL23933673M
    ISBN 100819444375
    LC Control Number2003268660

    A method of assist feature OPC layout is introduced using a frequency model-based approach. Through low-pass spatial frequency filtering of a mask function, the local influence of zero diffraction energy can be determined. By determining isofocal intensity threshold requirements of an imaging process, a mask equalizing function can be designed. This provides the basis for frequency model-based Cited by: 8. Optical Microlithography XV, Proc. SPIE , Other authors Materials and process issues delaying the Introduction of ArF lithography into production (part 1).


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[Anthony Yen; Society of Photo-optical Instrumentation. Long-run-time performance characteristics of a line-selected 2-kHz F2 laser for optical microlithography Author(s): Georg Soumagne; Shinji Nagai; Naoto Hisanaga; Shinobu Nanzai; Yoshinori Ochiishi; Ayako Ohbu; Junichi Fujimoto; Hakaru Mizoguchi.

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Proc. SPIEOptical Microlithography XV, pg (30 July ); doi: / Read Abstract + Newtonian design forms have been developed to explore higher numerical aperture imaging systems at a wavelength of nm with elements made of CaF 2 crystal.

Optical Microlithography XV, SPIE Vol.pp. It is made available as an electronic reprint with permission of SPIE. One print or electronic copy may be made for personal use only.

Systematic or multiple reproduction, distribution to multiple locations via electronic or other means. Optical lithography, like any imaging technology, has resolution limits that are governed in part by the wavelength of the light used to form the images.

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This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography.

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Optical microlithography XIV: 27 February-2 March,Santa Clara, [California], USA. [Christopher J Progler; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.;]. Optical Microlithography XV, SPIE Vol.

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KEYWORDS: Diffraction, Metrology, Etching, Scanners. Optical Lithography. Photolithography is a patterning process in which a photosensitive polymer is selectively exposed to light through a mask, leaving a latent image in the polymer that can then be selectively dissolved to provide patterned access to an underlying substrate.

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Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features.

Basic Optics: Microlithography Imaging Aberrations, Defocus, and Zernike Polynomials • Definition of a perfect optical system: • 2.

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Cambridge Core - Electromagnetics - Optical Holography - by P. Hariharan. This book is a greatly expanded edition of what has become one of the best known introductions to the principles, techniques and applications of optical by: Optical lithography is being pushed into a regime of extreme-numerical aperture (extreme-NA).

The implications of the nonscalar effects of high-NA lithography (above ) have been discussed now for many years1. This paper considers the consequences of imaging at numerical apertures above with the oblique imaging angles required for low k1 by: Contact lithography is still commonly practiced today, mainly in applications requiring thick photoresist and/or double-sided alignment and exposure.

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